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Automated Wafer Mask Alignment

Fraunhofer CMI - Center for Manufacturing Innovation

Fraunhofer CMI - Custom Automation Project - Wafer Mask Alignment
© Fraunhofer CMI.

Custom automation for accurate self-positioning of lithography masks

  • Automated mask alignment for contact lithography
  • Utilized two microscope camera systems
  • Through-mask field of view
  • Robotic or manual wafer loading
  • Capable of adjusting wafer position using 0.1 micron increments
  • Maintained alignment accuracy of 1 micron
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Portrait of Bill Mosolgo

Bill Mosolgo

Business Development

Fraunhofer CMI - Center for Manufacturing Innovation


15 Saint Mary's Street
Brookline, MA 02446-8200

+1 617-353-1888
+1 617-353-1896