Automated Wafer Mask Alignment
Fraunhofer CMI - Center for Manufacturing Innovation
- © Fraunhofer CMI.
Custom automation for accurate self-positioning of lithography masks
- Automated mask alignment for contact lithography
- Utilized two microscope camera systems
- Through-mask field of view
- Robotic or manual wafer loading
- Capable of adjusting wafer position using 0.1 micron increments
- Maintained alignment accuracy of 1 micron
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