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| Online Publications
Model Considerations, Calibration
Issues, and Metrology Methods for Resist-Bias Models Application of the Hybrid
Finite-Difference Time-Domain Method to Modeling Curved Surfaces
in Three-Dimensional Lithography Simulation Illuminator optimization
for projection printing An Exact Solution for the Optical
Absorbance of Thin Films OPC Corrections Algorithms with Resist
Processing Modeling of Mutilayer Ion Etching
Processes Manufacturability of Electronic
Chips Modeling Process Latitude in
UV Projection Lithography Exact Solution of Dill's Model
Equations for Positive Photoresist Kinetics Exposure Bleaching of Nonlinear
Resist Materials: Exact Solution The bi hamiltonian formulation
of the landau Lifshitz equation Standing waves in optical
positive photoresist films: a new approach Optical microlithography: some analytical
results Simulation of three dimensional
positive photoresist images Numerical Simulation of Submicron
Photolithographic Processing Three dimensional profile simulation
for positive photoresists Comprehensive 3-D notching simulator
with non-planar substrates Simulations of bar printing over
a MOSFET device using i-line and deep-UV resists Process latitudes in projection
printing Characterization and simulation
of acid catalyzed DUV positive A focus vernier for optical lithography Suitability of high numerical
aperture i-line steppers with oblique illumination for linewidth
control in 0.35µm complex circuit patterns Experiment and simulation of
sub-0.25 µ m resist processes for 193nm lithography Vector aerial image with off-axis
illumination Automated determination of CAD
layout failures through focus: experiment and simulation Aerial Image of 3D Phase-Shifted
Reticle - 3D FAIM OPTIMASK: An OPC algorithm for
Chrome and Phase-Shift Mask Design Optimization of Stepper Parameters
and their influence on OPC Simulation Fidelity in Microlithography Calculation of image profiles for
contrast enhanced lithography Resist development described by
least action principle line profile prediction A three dimensional profile modeling
algorithm for positive photoresists Defocus asymmetry in projection
printing Offline Publications E. Barouch, S Knodle, S.A. Orszag, and M Yeung. 1999. Illuminator optimization for projection printing. In Optical Microlithography XII, edited by Luc Van den hove, Proc. SPIE: 3679. M. S. Yeung and E. Barouch. 1999. Application of the Hybrid Finite-Difference Time Domain Method to Modeling Curved Surfaces in 3D Lithography Simulation. In Optical Microlithography XII, edited by Luc Van den hove, Proc. SPIE: 3679. E. W. Conrad, D. C. Cole, D. P. Paul, and E. Barouch. 1999. Model Considerations, Calibration Issues, and Metrology Methods for Resist-Bias Model. In Metrology, Inspection, and Process Control for Microlithography XIII, edited by B. Singh, Proc. SPIE: 3677. |
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| Comments/Questions? | Boston University | College of Engineering | Department of Manufacturing Engineering | ||||