{"id":16,"date":"2012-07-23T14:24:49","date_gmt":"2012-07-23T18:24:49","guid":{"rendered":"https:\/\/www.bu.edu\/pcl\/?page_id=16"},"modified":"2013-10-04T15:52:11","modified_gmt":"2013-10-04T19:52:11","slug":"publications","status":"publish","type":"page","link":"https:\/\/www.bu.edu\/pcl\/publications\/","title":{"rendered":"Publications"},"content":{"rendered":"

Electrospinning of Nanofibers,\u00a0 Plasma Spray,\u00a0 Electron-Beam Deposition, Crystal Growth, CVD, Process Control<\/b><\/p>\n

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Patents<\/span><\/b><\/p>\n

1. \u201cControl System for the Czochralski Process”, M.A. Gevelber and G. Stephanopoulos, U.S. Patent no. 4,857,278, 8\/89<\/p>\n

2. \u201cInterface Angle Estimation System”, M.A. Gevelber and A.T. Patera, U.S. Patent no. 4,943,160, 7\/90.<\/p>\n

3. \u201cMethod for Closed-Loop Control of CVD Process”, M.A. Gevelber and M. Toledo-Quinones, U.S. Patent no. 6,162,488, 12\/2000.<\/p>\n

4. \u201cFeedback Enhanced Plasma Spray Tool”, M.A. Gevelber, D. Wroblewski, Fincke, W. D. Swank, R.L. Bewley, D.C. Haggard, U.S. Patent 6,967,304, 11\/22\/2005.<\/p>\n

4. \u201cFeedback Enhanced Plasma Spray Tool”, M.A. Gevelber, D. Wroblewski, U.S. Patent divisional application, molten plasma flux control, application, 9\/2007, \u00a0\u00a07,952,047, \u00a0\u00a0granted 4\/11.<\/p>\n

5. \u201cEbeam Vision System for Monitoring and Control\u201d, Michael Gevelber, Brian Vattiat, and Adam Brewster, U.S. Patent no. 7,479,632, 1\/20\/2009.<\/p>\n

6. Vattiat, B., Wroblewski, D., Gevelber, M., \u201cPlasma State and Flux Sensor\u201d, 8,013,994, \u00a0published 9\/6\/11.<\/p>\n

7. Patent filing: \u201cAutomated technique of measuring room air change rates in HVAC system\u201d, \u00a0D. Wroblewski, M. Gevelber, P. Gallagher, U.S., Provisional Patent Application No.: 61\/561\/131 Filed Nov. 17, 2011; PCT Application filed Nov. 17, 2012 No: PCT\/US12\/65786.<\/p>\n

8. Michael Gevelber and Xuri Yan, Provisional Patent Application, 10\/09\/2007, \u201cControl System for Electrospinning of Nano-Fibers\u201d (60\/998,214), BU case 07-79.<\/p>\n

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Electrospinning of Nanofibers.<\/span><\/b><\/p>\n

<\/span><\/b>1. “Electrospinning of nanofibers: Characterization of jet dynamics and humidity effects”, by Yan and Gevelber,\u00a0 accepted for publication,\u00a0 submitted to the Journal of Particulate Science and Technology.<\/p>\n

2. Y. Cai, M. Gevelber, \u201cThe Effect of Relative Humidity and Evaporation Rate on Electrospinning: fiber diameter and measurement for control implications\u201d, , Journal of Material Science, Jan. 2013.<\/p>\n

3. X. Yan, M. Gevelber, \u201cInvestigation of Electrospun Fiber Diameter Distribution and Process Dynamics\u201d, published in the Proceedings of the Electrostatics Joint Conference, Boston University, June 16-18, 2009 and in the Journal of Electrostatics<\/i>, 68 (October 2010), pp. 458-264.<\/p>\n

4. X. Yan and and M. Gevelber, \u201cProcess Dynamics and Control Analysis for Electrospinning Nanofibers\u201d, pp1-8, WeBT4.1, in the 2010 ASME Dynamic Systems and Control Conference Proceedings, ed P. Meckl, Cambridge MA, September 2010.<\/p>\n

5. X. Yan, and M. Gevelber, \u201cElecrospinning of Nanofibers: Analysis of Diameter Distribution and Process Dynamics for Control\u201d, In the \u201c2010 International symposium on Flexible Automation\u201d Conference Proceedings, ed. N. Sugimura and J. Cao, July 2010, Tokyo Japan.<\/p>\n

6. X. Yan, M. Gevelber, \u201cAnalysis of Electrospinning Nanofibers: Diameter Distribution, Process Dyanmics, and Control\u201d, ASME International Mechanical Engineering Congress<\/i> , Oct 31-Nov. 6, 2008, Boston, IMECE2008-68299, pp8<\/p>\n

7. Michael Gevelber, Xuri Yan, Jian H. Yu, Gregory C. Rutledge, \u201cElectrospinning Process Dynamics and Fiber Diameter Distributions for Development of Real-Time Control\u201d, presented at and published in proceedings of Symposium B. Processing of Nanofibers, MRS Fall 2006, MRS Proceedings, Vol. 948E, \u201cStructure, Processing and Properties of Polymer Nanofibers for Emerging Technologies\u201d, editors K.Kiick and T. Long, paper 0948-B07-02<\/p>\n

Plasma Spray<\/span><\/b><\/p>\n

1. D. Wroblewski, G. Reimann, M. Tuttle, D. Radgowski, M. Cannamela, S. Basu, M. Gevelber, \u201cSensor Issues and Requirements for Developing Real-Time Control for Plasma Spray Deposition\u201d, Journal of Thermal Spray Technology<\/i>,\u00a0 Vol. 19(4), June 2010, pp. 723\u2014735.<\/p>\n

2. M. Gevelber, D. Wroblewski, M. Cannamela, S. Basu, D. Radgowski, and M. Tuttle, \u201cSensor and Control Design Issues for Developing Real-Time Deposition Rate Control for Plasma Spray\u201d, pp 1-8, TuAT6.6, in the 2010 ASME Dynamic Systems and Control Conference Proceedings, ed P. Meckl, Cambridge MA, September 2010.<\/p>\n

3. M. Gevelber, D. Wroblewski, M. Canemella, S. Basu, \u201cSensor Design Issues for Implementation of Real-Time Depsoition Rate Control for Plasma Spray\u201d, In the \u201c2010 International symposium on Flexible Automation\u201d Conference Proceedings, ed. N. Sugimura and J. Cao July 2010, Tokyo Japan<\/p>\n

4. M. Gevelber, D. Wroblewski, B. Vattiat, O. Ghosh, M. VanHout, and S.N. Basu, \u201cIssues and Requirements for Developing a Plasma Spray Deposition Rate Sensor for Real-time control\u201d, International Thermal Spray Conference<\/i>, Maastricht, The Netherlands, June 2-4, 2008, Conference Proceedings: ed. E. Lugscheider, 2008, pp 912-916.<\/p>\n

5. D. Wroblewski, O. Ghosh, A. Lum, M. VanHout, S.N. Basu, M. Gevelber, and D. Willoughby, \u201cAnalysis of Plasma Spray Particle State Distribution for Deposition Rate Control\u201d, International Thermal Spray Conference<\/i>, Maastricht, The Netherlands, June 2-4, 2008, Conference Proceedings: ed. E. Lugscheider, 2008, pp 838-843<\/p>\n

6. Gevelber, D. Wroblewski, M. VanHout, O. Ghosh, D. Willoughby, S. Basu, \u201cSensor and Control Design Issues for Implementation of Real-Time Deposition Rate Control for Plasma Spray\u201d, ASME International Mechanical Engineering Congress , Oct 31-Nov. 6, 2008, Boston, IMECE2008-68958, pp 10.<\/p>\n

7. D. Wroblewski, O. Ghosh, A. Lum, D. Willoughby, M. VanHout, K. Hogstrom, S. Basu,\u00a0 M. Gevelber \u201cModeling and Parametric Analysis of Plasma Spray Particle State Distribution for Deposition Rate Control\u201d,\u00a0 IMECE2008-68752, ASME International Mechanical Engineering Congress<\/i>, Oct 31-Nov. 6, 2008, Boston.<\/p>\n

8. S.N. Basu, G. Ye, R. Khare, B. McCandless, M. Gevelber, D. Wroblewski, \u201cDependence of splat remelt and stress evolution on surface roughness length scales in plasma sprayed thermal barrier coatings,\u201d\u00a0 Int. Journal of Refractory Metals and Hard Materials, 2009.<\/p>\n

9. Gevelber, M., Cui, C., Vattiat, B., Ghosh, O., Wroblewski, D., Basu, S., \u201cReal Time Control for Plasma\u00a0 Spray: Sensor issues, torch nonlinearities, and control of coating thickness\u201d, Paper 0255, Proceedings of the 2006 International Symposium on Flexible Automation, Osaka,\u00a0\u00a0\u00a0\u00a0\u00a0 pp. 686-691, July 2006<\/p>\n

10.\u00a0 Gevelber M., Cui C., Vattiat B., Ghosh O. , Wroblewski D., Basu S., \u201cReal Time Control for Plasma Spray: Sensor Issues, Torch Nonlinearites, and Control of Coating Thickness\u201d,\u00a0 International Thermal Spray Conference, Basel, 2005, pp. 667-672.<\/p>\n

11. M. Gevelber, C.Cui, B. Vattiat, D. Wroblewski, \u201cReal-Time Control for Plasma Spray: Production Issues and Engineering Coating Structures\u201d, published in the Proceedings of the 2004 Japan-USA Symposium on Flexible Automation; July 19-21 2004; Denver, Colorado, Paper UL 67.<\/p>\n

12.\u00a0 Basu S.N., Ye G., Gevelber M., and Wroblewski D., \u201cMicrocrack formation in Plasma Sprayed Thermal Barrier Coatings\u201d, International Journal of Refractory Metals and Hard Materials<\/i>, 23, 335-343(2005).<\/p>\n

13.\u00a0 Gevelber, M., Cui, C., Vattiat, B., Wroblewski, D., Fincke, J.R., and Swank, W.D., \u201cReal-Time Control for Plasma Spray: production issues and distribution implications” , International Thermal Spray Conference, 5-8 May, 2003, in Orlando, FL., pp 1121-1120.<\/p>\n

14.\u00a0 Fincke, Swank, Bewley, Haggard, Gevelber, Wroblewski,\u00a0 \u201cControl of Particle Temperature, Velocity, and Trajectory in\u00a0\u00a0\u00a0 the Thermal Spray Process\u201d, International Thermal Spray Conference, 5-8 May, 2003, in Orlando, FL., pp. 1093-1100.<\/p>\n

15.\u00a0 Basu, S.N., Ye, G., Gevelber, C. Cui, D. Wroblewski, M., Fincke, J.R., and Swank, W.D., \u201cPlasma Sprayed Coatings with Engineered Microstructures”, International Thermal Spray Conference, 5-8 May, 2003, in Orlando, FL.,\u00a0 pp. 1599-1608<\/p>\n

16.\u00a0 Wroblewski, D., Khare, R., Gevelber, M., 2002, \u201cSolidification Modeling of Plasma Sprayed TBC: Analysis of Remelt and Multiple Length Scales of Rough Substrates,” J. of Thermal Spray Tech, Vol. 11 (2) June 2002, pp 266-275.<\/p>\n

17.\u00a0 J.R. Fincke, W.D. Swank, R.L. Bewley, D.C. Haggarda, M. Gevelber, D. Wroblewski, \u201cDiagnostics and Control in the Thermal Spray Process”, April 2001, Journal of Surface and Coatings Technology, Sept-Oct 2001, pp. 537-543.<\/p>\n

18.\u00a0 M. Gevelber, D. Wroblewski, J. Fincke, W.D. Swank, \u201cSystem Characterization and Plasma Particle Distribution Analysis for Development of Closed Loop Control for Plasma Spray”, HTD Vol. 366-3; Proceedings of the ASME: Heat Transfer Division, November 2000, Vol 3, pp. 419-426.<\/p>\n

19.\u00a0 Smith, C.W., Narendra, K.S., and Gevelber, M.A., \u201cModelling for Control of Induction Plasma Deposition”, Chemical Engineering Science, Vol. 50, No. 23, 1995, pp3747-3761.<\/p>\n

20.\u00a0 Narendra, K.S.,\u00a0 Smith, C.W.,\u00a0 and\u00a0 Gevelber, M.A., \u201cAnalysis of Induction Plasma Deposition Dynamics for Control”, Journal of Dynamic Systems, Measurement,\u00a0 and Control,\u00a0 Vol. 117, No. 3, pp429-432.<\/p>\n

21.\u00a0 Narendra, K.S., and\u00a0 Gevelber, M.A.,“Modelling and Control of Induction Plasma Deposition”, Control Methods for Manufacturing Processes, ASME, Dynamic Systems and Controls, November 1991, DSC-Vol. 28, pp 7-12.<\/p>\n

Electron Beam Deposition for Optical Coatings<\/span><\/b><\/p>\n

<\/span><\/b>1. E. Speyerer, M. Gevelber, D. Radgowski, \u201cDevelopment of an Adaptive System ID Method for Enabling Advanced E-Beam Sweep Pattern Design\u201d, pp 1-8 TuAT6.1, in the 2010 ASME Dynamic Systems and Control Conference Proceedings, ed P. Meckl, Cambridge MA, September 2010<\/p>\n

2. G. Reimann, D. Radgowski, M. Gevelber, \u201cMethods for Improving Optical Coating Quality for E-\u00a0\u00a0\u00a0\u00a0 beam Deposition:\u00a0 Minimizing Deposition Rate Variations and Manufacturing Case Studies\u201d, 51st Annual Technical Conference Proceedings of Society of Vacuum Coaters<\/i>, 2008 Apr 19-24 Chicago IL , Apr 19-24, 2008 Chicago IL , pp 427-432.<\/p>\n

3. D. Radgowski, G. Reimann, M. Gevelber, “Critical Measurement and Control Issues in Selecting a Quartz Crystal Monitor,” 51st Annual Technical Conference Proceedings of Society of Vacuum Coaters<\/i>, Apr 19-24, 2008 Chicago IL pp. pg 27-30, 2008.<\/p>\n

4. G. Reimann, D. Radgowski, M. Gevelber, “Achieving reliable optical thickness without an optical monitor: industrial benchmarks,” 50th Annual Technical Conference Proceedings of Society of Vacuum Coaters<\/i>, pp. 348-353, 2007.<\/p>\n

5. Gevelber, M., Xu, B., Reimann, G., \u201cTools for Improving Precision Optical Coatings Through E-Beam Sweep Design\u201d, published in the proceedings of the 2007 Optical Interference Coatings (OIC) Conference, June 2007, Tucson AZ, OSA, paper TuCPDP1.<\/p>\n

6. Reimann, G., Vattiat, B. Brewster, A., Gevelber, M., \u201cDevelopment of a Robust and Optimized Automatic Tuning System For Control of Evaporation Processes\u201d, Paper 0238, Proceedings of the 2006 International Symposium on Flexible Automation, Osaka,\u00a0 pp. 663-670, July 2006.<\/p>\n

7. Gevelber, M., B. Xu, D. Smith, \u201cImproved Rate Control for E-beam Evaporation and Evaluation of Optical Performance Improvements\u201d, Applied Optics,\u00a0 Vol. 45, Issue 7, March 2006, pp 1456-1460.<\/p>\n

8. Reimann, G., Vattiat, B., Brewster, A., Gevelber, M., Hildebrand, J., Hildebrand, C., \u201cRobust Controller Tuning for Evaporative Deposition Processes: Results from Manufacturing Case Studies\u201d, Proceedings of the Society of Vacuum Coaters, 49th<\/sup> annual technical conference, Washington DC, 2006, pp. 421-427.<\/p>\n

9. Xu, B., Gevelber, M., Smith, D., Reimann, G., Bellum, J., \u201cE-gun Sweep Design to Improve Silica Coating Performance: E-Gun nonlinearity investigation and silica evaporation modeling for sweep design\u201d, Proceedings of the Society of Vacuum Coaters, 49th<\/sup> annual technical conference, Washington DC, 2006, pp. 319-325.<\/p>\n

10.\u00a0 Reimann, G., Gevelber, M., Vattiat, B., Hildebrand, J., Hildebrand, C., \u201cRobust System Identification and Optimized Tuning for Control of Evaporation Processes\u201d, Proceedings of the Society of Vacuum Coaters 48th<\/sup> annual technical conference. Denver, CO, 2005, pp 697-702.<\/p>\n

11.\u00a0 Xu, B., Gevelber, M., Smith, D., Vattiat, B., \u201cImproving Rate Control in Electron-Beam Evaporated Optical Coatings:, maintaining source surface uniformity for large size laser optics coatings and evaluation of system drift\u201d, Proceedings of the Society of Vacuum Coaters 48th<\/sup> annual technical conference. Denver, CO,\u00a0 2005, pp 400-405.<\/p>\n

12.\u00a0 M. Gevelber, B. Xu, D. Smith, \u201cImproving Rate Control in Electron-Beam Evaporated Optical Coatings\u201d, in Vacuum Technology and Coating, August 2004, pp 58-65<\/p>\n

13.\u00a0 Gevelber, M., B. Xu, D. Smith, \u201cImproved Rate Control for E-beam Evaporation and Evaluation of Optical Performance Improvements\u201d, paper ME 9 in the Proceedings of the Ninth Optical Interference Coating Conference of the OSA, Tucson, June 2004.<\/p>\n

14.\u00a0 M. Gevelber, B. Xu, D. Smith, J. Oliver and J. Howe, \u201cImproving Rate Control in Electron-Beam Evaporated Optical Coatings: the role of arcing and controller tuning\u201d, Proceedings of the Society of Vacuum Coaters 47th<\/sup> annual technical conference. Dallas, TX, April 24 \u2013 29, 2004, pp92-98.<\/p>\n

15.\u00a0 M. Gevelber, B. Xu, N. Duanmu, D. Smith, \u201cDevelopment of Improved SiO2 Rate Control for Electron-Beam Evaporated Optical Coatings\u201d, published in the Proceedings of the Japan \u2013 USA Symposium on Flexible Automation, Denver, Colorado, July 19-21, 2004, paper UL 75.<\/p>\n

16.\u00a0 Gevelber, M., Xu, B., Smith, D., \u201cImproving Rate Control for E-Beam Deposited Optical Coatings”, published in the 46th<\/sup> Proceedings of the Society of Vacuum Coaters, San Francisco CA., May 2003, pp 18-23.<\/p>\n

Crystal Growth<\/span><\/b><\/p>\n

1.\u00a0J. Winkler, M. Neubert, J. Rudolph, N. Duanmu, and M. Gevelber, Chapter 3, \u201cCzochralski Process Dyanamics and Control Design\u201d, in \u201cCrystal Growth Processes Based on Capillarity: Czochralski, Floating zone, shaping and crucible techniques<\/i>\u201d, edited by Thierry Duffar, April 2010.<\/p>\n

2. M. Gevelber, D. Wilson, N. Duanmu, \u201cModelling Requirements for Development of an Advanced Czochralski Control System”,\u00a0 Journal of Crystal Growth, 230 (2001) pp217-223.<\/p>\n

3. Gevelber, M.A., \u201cDynamics and Control of the Czochralski Process, Part 4: Control structure design for interface shape control and performance evaluation”, Journal of Crystal Growth, 139, 1994, pp.286-301.<\/p>\n

4. Gevelber, M.A., \u201cDynamics and Control of the Czochralski Process, Part 3: Interface dynamics and control requirements”, Journal of Crystal Growth, 139, 1994, pp. 271-285.<\/p>\n

5. Gevelber, M.A., and Stephanopolous,\u00a0 G., \u201cModelling and Dynamic Characterization of the Czochralski Process”, in Journal of Dynamic Systems, Measurement,\u00a0 and Control, Vol. 115, No. 1, pp. 109-114, 1993.<\/p>\n

6. Gevelber, M.A., and Stephanopolous, G., \u201cControl and System Design for the Czochralski Crystal Growth Process Journal of Dynamic Systems, Measurement, and Control, Vol. 115, No. 1, pp. 115-121, 1993.<\/p>\n

7. Gevelber, M.A. and Stephanopoulos, G., \u201cControl and System Design for the Czochralski Crystal Growth Process”, in Control Methods for Manufacturing Processes}, edited by D.E. Hardt, ASME DSC vol. 9, November 27, 1988,\u00a0 pp. 35-40.<\/p>\n

8. Gevelber, M.A., Stephanopoulos, G., and Wargo, M.J., \u201cDynamics and Control of the Czochralski Process, Part 2: Objectives and control structure design”, Journal of Crystal Growth, 91, 1988, pp. 199-217.<\/p>\n

9. Gevelber, M.A., Stephanopoulos, G., and Wargo, M.J., \u201cDynamics and Control of the Czochralski Process, Part 1: Modelling and dynamic characterization”, Journal of Crystal Growth, 84, 1987, pp. 647-668.<\/p>\n

10. Gevelber, M.A., Wargo, M.J., Stephanopoulos, G., \u201cAdvanced Control Design Consideration for the Czochralski Process”, Journal of Crystal Growth, 85, 1987, pp. 256-263.<\/p>\n

Process Control<\/span><\/b><\/p>\n

1. M. Gevelber, \u201cProcess Control”, in the Encyclopedia of Electrical and Electronic Engineering, John Wiley & Sons, 1999.<\/p>\n

2. Gevelber, M.A., “A Geometric Analysis Method for Control Structure and System Design”, in Control Methods for Manufacturing Processes}, edited by J.L. Stein, Y. Koren, J. Holmes, ASME DSC vol. 18, December 1989, pp 123-128.<\/p>\n

CVD<\/span><\/b><\/p>\n

1. Gevelber, M.A., Bufano, M.,\u00a0 Quinones, M.T., \u201cDynamic Modelling Analysis of Chemical Vapor Deposition for Control”, Journal of Dynamic Syst., Meas. and\u00a0 Control, Vol. 120, 1998, pp164-169.<\/p>\n

2. Gevelber, M.,\u00a0 Quinones, M.T.,\u00a0 Bufano, M.L., \u201cTowards Closed-Loop Control of CVD Coating Microstructure, February 1995, Journal of Materials Science and Engineering A, Vol. 209, 1996, pp. 377-383.<\/p>\n

3. Gevelber, M.A., M.C. Deniz, R. Liu, and E. Sumitra, \u201cModelling TiN Deposition for Control of CVD”, \u201cInternational Conference on CVD XIII”, 189th meeting of the Electrochemical Society, Los Angeles, May 1996, Proceedings Vol 96-5, ed. T.M. Bessmann et. al., pp. 157-162.<\/p>\n

4. Gevelber, M.A.,\u00a0 Quinones, M.T.,\u00a0 Bufano, M.L., \u201cDynamic Modelling of CVD for Real-Time Control of Microstructure”, in the Materials Research Society Symposium on CVD of Refractory Metals and Ceramics III, edited by Lee, W.Y., Gallois, B.M.,\u00a0 Pickering, M.A., Vol. 363, 1995, pp. 33-38.<\/p>\n

5. Gevelber, M.A., Quinones, M. T., and\u00a0 Bufano, M., \u201cDynamic Characterization of CVD for Real-Time Control”, in the Proceedings of the 1994 Japan-USA Symposium on Flexible Automation, Kobe Japan, July 1994, pp. 1417-1423.<\/p>\n

6. Gevelber, M.A.,\u00a0 Bufano, M, Quinones, M. T.,\u00a0 Brown, D., and Passaro, R., \u201cDynamic Modelling for Control of CVD”, American Control Conference Proceedings, June 29, 1994, pp. 2623-2627.<\/p>\n

7. Quinones, M.T.,\u00a0 Bufano, M.,\u00a0 and Gevelber, M., \u201cLumped Modelling and Analysis of CVD Mass Transport and Chemical Reaction Dynamics”, in Transport Phenomena in Non-Conventional Manufacturing and Materials Processing,\u00a0 edited by V. Prasad and F. Copera, pp. 93-100, HTD-259, Nov. 1993.<\/p>\n

Conference Presentations<\/span><\/b><\/p>\n

<\/span><\/b>1. Matthew Tuttle , Dennis Radgowski, Michael Gevelber, Donald Wroblewski, Soumenda Basu, \u00a0\u00a0\u00a0\u201cRequirements for Developing Robust Plasma Spray Control for Production Operations\u201d, presented in\u00a0 \u201cProcessing and Performance of Advanced Thermal Barrier Coatings – Session II\u201d May\u00a0 21-24, Houston Texas, \u00a0International Thermal Spray Conference 2012<\/p>\n

2. Michael Gevelber, Yunshen Cai, Thierry Desire, and Xuri Yan, \u201cDeveloping Real-Time Control for Electrospinning of Nanofibers: Evaporation and Measurement Considerations for Aqueous and Non-Aqueous Solutions\u201d, \u00a0Presentation at Nanofiber Society Conference and extended abstract publication,\u00a0 Nov \u00a07-9, 2012, Boston<\/p>\n

3. M. A. Gevelber, \u201cProcess Dynamics and Measurement Considerations for Developing Electrospinning Control: needle and free surface system\u201d, presented at \u201cNanofibers for the 3rd<\/sup> Millennium\u201d,\u00a0 NC State, The Nonwovens Institute, August 2010.<\/p>\n

4. M.A. Gevelber, M. Cannemela, D. Wroblewski, S. Basu, \u201cAlternative Real-Time Control Strategies and Sensing Requirements for Improving Thermal Spray Performance\u201d, presented at paper given at the International Thermal Spray Conference, Las Vegas, May 2009.<\/p>\n

5. D. Wroblewski,\u00a0 M. Cannamela, M. Gevelber, O. Ghosh, M. VanHout, A. Lum, K. Hogstrom, S. Basu , \u201cPlasma Spray Process Modeling for Control: Effect of Torch Inputs on Particle State Distributions\u201d, paper given at the International Thermal Spray Conference, Las Vegas, May 2009.<\/p>\n

6. M. A Gevelber,\u00a0 \u201cAlternative Control Strategies and Requirements for Improving Thermal Spray Performance\u201d, presented at the \u201cSymposium on Improving Reliability and Consistency in Thermal Spray, Dec 2-3 , 2008, Montreal Quebec, organized by the ASM Thermal Spray Society.<\/p>\n

7. X. Yan, M. Gevelber, \u201cInvestigation of Electrospinning Parameters that Determine Fiber Diameter Distribution\u201d The Fiber Society 2008 Technical Conference, Oct 1-3, 2008,\u00a0 Boucherville Canada,\u00a0 Abdellah Ajji, Chair<\/p>\n

8. M. Gevelber and X. Yan, \u201cAnalysis of Electrospinning Process Dynamics and Resulting Nanofiber Diameter Distributions\u201d The Fiber Society 2007 Technical Conference, Oct 911, 2007, University of California at Davis, CA, ,\u00a0 You-Lo Hsieh, Chair<\/p>\n

9. Gevelber, M., Ghosh, O., Cui, C., Wang, H., Basu, S., Wroblewski, D., \u201cAlternative Strategies for Plasma Sprayed Coating Thickness Control\u201d, paper given at the International Thermal Spray Conference, Seattle, May 2006.<\/p>\n

10.\u00a0 Reimann, G., Vattiat, B., Brewster, A., Gevelber, M. A., Hildebrand, J., Hildebrand. C., \u201cRobust System Identification and Optimized Tuning for Control of Evaporation Processes: benchmark study results of manufacturing performance\u201d, paper given at AVS, Boston November 2005.<\/p>\n

11.\u00a0 Gevelber, M., \u201cManufacturing Performance Evaluation of Alternative Control Strategies for IGT Thermal Barrier Coatings\u201d, Combustion Turbine Coatings Symposium, Houston Texas, October 26, 2005, invited.<\/p>\n

12.\u00a0 Michael Gevelber, Brian Vattiat, Chenhuan Cui,\u00a0 Boston University, Manufacturing Engineering,\u00a0 Larry Pollard, William Barker,\u00a0 Progressive Technologies, David Harter,\u00a0 Siemens Westinghouse Power Corporation-Stationary Fuel Cells, Performance Comparison of Various Sensor Systems and Plasma Spray Torches\u201d, poster given at the International Thermal Spray Conference, Basel, May 2005.<\/p>\n

13.\u00a0 M. Gevelber, C. Cui, B. Vattiat, D. Wroblewski, S. Basu, \u201cReal-Time Control for Plasma Spray: Production requirements, sensor issues, control design problems and solutions\u201d, paper given at the Sensors and Controls 2004 Workshop, International Thermal Spray Society, October 2004<\/p>\n

14.\u00a0 Gevelber, M., B. Xu, D. Smith, \u201cImproved Rate Control for E-beam Evaporation and Evaluation of Optical Performance Improvements\u201d, presented at the Optical Interference Coating Conference of the OSA, Tuscon, June 2004.<\/p>\n

15.\u00a0 Basu, S.N., Ye, G., Cui, C., Gevelber, M., Wroblewski, D., Fincke J.R., and Swank, W.D., Engineering Plasma Sprayed Coating Microstructure by Advanced Control, presented at the Fall MRS Meeting, Dec. 2-6, 2002, Boston, MA.<\/p>\n

16.\u00a0 Ye, G., Basu, S., Wroblewski, D., Gevelber, M., Fincke, J., Swank, W, ”Characterization of the Plasma Spray Process for the Development of Closed Loop Control”, presented at the ASM Materials Solutions Conference, Cincinnati, November 1999.<\/p>\n

17.\u00a0 Khare, R., Wroblewski, D., Gevelber, M.A., \u201c2-D Thermal Modeling of Splat Cooling on Rough Substrates”, presented at ASM Materials Solutions Conference, Cinncinnati, November 1999.<\/p>\n

18.\u00a0 Y. Chen, Z. Ren, P. Nair,\u00a0 and M. Gevelber, \u201cModel Based Control Analysis of the Czochralski Process”, Presented at the 13th International Conference on Crystal Growth, Jerusalem Israel, July\u00a0 1998.<\/p>\n

19.\u00a0 Y. Chen, J. Jiang and M. Gevelber, \u201cProcess Modelling Analysis for Enhanced Control of INP Synthesis”, Presented at the 13th International Conference on Crystal Growth, Jerusalem Israel, July\u00a0 1998.<\/p>\n

 <\/p>\n

 <\/p>\n

 <\/p>\n","protected":false},"excerpt":{"rendered":"

Electrospinning of Nanofibers,\u00a0 Plasma Spray,\u00a0 Electron-Beam Deposition, Crystal Growth, CVD, Process Control Patents 1. \u201cControl System for the Czochralski Process”, M.A. Gevelber and G. Stephanopoulos, U.S. Patent no. 4,857,278, 8\/89 2. \u201cInterface Angle Estimation System”, M.A. Gevelber and A.T. Patera, U.S. Patent no. 4,943,160, 7\/90. 3. \u201cMethod for Closed-Loop Control of CVD Process”, M.A. Gevelber […]<\/p>\n","protected":false},"author":1317,"featured_media":0,"parent":0,"menu_order":8,"comment_status":"closed","ping_status":"closed","template":"","meta":[],"_links":{"self":[{"href":"https:\/\/www.bu.edu\/pcl\/wp-json\/wp\/v2\/pages\/16"}],"collection":[{"href":"https:\/\/www.bu.edu\/pcl\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.bu.edu\/pcl\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.bu.edu\/pcl\/wp-json\/wp\/v2\/users\/1317"}],"replies":[{"embeddable":true,"href":"https:\/\/www.bu.edu\/pcl\/wp-json\/wp\/v2\/comments?post=16"}],"version-history":[{"count":4,"href":"https:\/\/www.bu.edu\/pcl\/wp-json\/wp\/v2\/pages\/16\/revisions"}],"predecessor-version":[{"id":93,"href":"https:\/\/www.bu.edu\/pcl\/wp-json\/wp\/v2\/pages\/16\/revisions\/93"}],"wp:attachment":[{"href":"https:\/\/www.bu.edu\/pcl\/wp-json\/wp\/v2\/media?parent=16"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}