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MICRO and NANO ELECTRONICS PROJECTS
Micro and Nano Lithography
Development and characterization of the next generation of micro and nano lithography simulation tools to help create the lithographic systems for the future.
Metrology
Development and use of electromagnetic computation combined with measurements to characterize micro and nano electronic structures via nondestructive and in-situ methods. Such techniques are extremely powerful at helping to monitor semiconductor manufacturing steps.
Novel Devices
Designing micro and nano electronic structures using novel physical aspects previously not adequately included in most conventional approaches, in attempts to provide manufacturable new technologies.
Process and Device Simulation
Improvement of advanced simulation codes, by exploring either device or process steps critical in semiconductor manufacturing.
Electromagnetics
Intensive numerical solution of MaxwellÕs equations for inclusion of electromagnetic effects in advanced microelectronic structures, such as for small cavities with light interacting with charge carriers and for interconnects in future high-speed microchips, where both electric and magnetic effects due to rapidly changing fields become important.
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