Advanced Materials Process Control
The primary research focus of this laboratory is to apply a systems-based approach to improving material processing capabilities.
Research projects involve an integrated effort of physical modeling, sensor development, system design, and control development. Current projects include work on plasma deposition for protective coatings, crystal growth for electronic applications, and chemical vapor deposition.
An experimental CVD system has been developed for implementing real-time control. A microbalance is used to measure growth rates in situ, and parallel DSP boards are used for data analysis and control. Related research includes development of analysis methods for identifying fundamental process constraints, as well as development of advanced sensors and observers to infer the process state.