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Wafer Mask Alignment

Fraunhofer Center for Manufacturing Innovation

Wafer Mask Alignment Before + After
© 2002 Fraunhofer CMI.

Accurate self-positioning of lithography masks

  • Automated mask alignment for contact lithography
  • Utilized two microscope camera systems
  • Through-mask field of view
  • Robotic or manual wafer loading
  • Capable of adjusting wafer position using 0.1 micron increments
  • Maintained alignment accuracy of 1 micron
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Contact

Portrait of Bill Mosolgo

Bill Mosolgo

Manager, Sales & Marketing

Fraunhofer Center for Manufacturing Innovation

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15 Saint Mary's Street
Brookline, MA 02446-8200
U.S.A.

Phone:
+1 617-353-1888
Fax:
+1 617-353-1896