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Home / Research / Focus Areas / Nanotechnology / Labs

Nanotechnology Lab Facilities

Nanometer Scale Engineering Laboratory
Precision Engineering Research Laboratory


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The Lab's name patterned with Chromium letters on a Silicon wafer.



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The letters have sub-micron widths and the patterning is done using electron beam lithography and thin film lift off techniques.

Nanometer Scale Engineering Laboratory

The Nanometer Scale Engineering Laboratory is located in the Metcalf Science and Engineering Building, within the Boston University Nanoscale Research Facility. Nanometer scale semiconductor mechanical devices are fabricated here using electron beam lithography, plasma and wet etching techniques. After fabrication, various state-of-the-art characterization techniques are employed to study the physical processes dominant in these nanomechanical devices. Among the fundamental phenomena studied are dissipation, fluctuations and surface effects at nanometer length scales.

The practical aspects of this research involve the design and fabrication of ultra-high speed nano-mechanical sensors, and development of surface nano-engineering techniques for improved device characteristics. The extreme sensitivity of these nanometer scale devices necessitates in situ characterization in Ultra High Vacuum (UHV). A UHV Surface Analysis System has recently been installed in the lab, with surface modification capabilities such as thermal annealing and ion beam milling, and various surface analysis tools including Atomic Force Microscopy (AFM) and Scanning Tunneling Microscopy (STM). In addition, optical interferometry techniques are being developed for ultra-sensitive displacement sensing in nanomechanical devices. The high operation frequencies of these devices extending into the microwave bands necessitate developing and employing high frequency electronics and techniques.

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Precision Engineering Research Laboratory

The Precision Engineering Laboratory study focuses on sensing, control, and fabrication at the limits of achievable precision. Areas of interest include microelectromechanical systems (MEMS), nanometer-scale actuation, micromachining, design of optical arrays, and microfluidics. Current projects include MEMS deformable mirrors, spatial light modulators, film stress modification, microvalve arrays, adaptive optics systems, tip-tilt mirror arrays, MEMS hydrophones, and networked control systems.

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