This course will discuss the characterization of materials' atomic and electronic structure. Atomic structure evaluation by x-ray diffraction, selected area- and convergent-beam electron diffraction; microstructure evaluation by transmission electron microscopy, principles of bright-field, dark-field and weak-beam imaging; principles of analytical electron microscopy using EDS, WDS, AES; study of chemical and bonding states by EELS, Raman spectroscopy and XPS/ESCA; laser-based non-destructive evaluation of mechanical properties of materials. Characterization methods for semiconductors include the study of point defects by electron paramagnetic resonance, of transport properties by magnetoresistance and Hall effect, of recombination phenomena by photoluminescennce and of junction properties by capacitance-voltage methods.

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